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William A Lanford
William A Lanford
Professor of Physics, University at Albany SUNY
Verified email at albany.edu
Title
Cited by
Cited by
Year
The hydrogen content of plasma‐deposited silicon nitride
WA Lanford, MJ Rand
Journal of applied physics 49 (4), 2473-2477, 1978
11451978
Infrared absorption strength and hydrogen content of hydrogenated amorphous silicon
AA Langford, ML Fleet, BP Nelson, WA Lanford, N Maley
Physical Review B 45 (23), 13367, 1992
7501992
Effect of cosmic rays on computer memories
JF Ziegler, WA Lanford
Science 206 (4420), 776-788, 1979
6011979
Lead diffusion in apatite and zircon using ion implantation and Rutherford backscattering techniques
DJ Cherniak, WA Lanford, FJ Ryerson
Geochimica et Cosmochimica Acta 55 (6), 1663-1673, 1991
5321991
Nuclear reaction analysis profiling as direct evidence for lithium ion mass transport in thin film ‘‘rocking‐chair’’ structures
WL R. B. Goldner, T. E. Haas, F. O. Arntz, S. Slaven, K. K. Wong, C. Shepard
Applied Physics Letters 62, 1699, 1993
474*1993
New precision technique for measuring the concentration versus depth of hydrogen in solids
WA Lanford, HP Trautvetter, JF Ziegler, J Keller
Applied Physics Letters 28 (9), 566-568, 1976
4101976
Hydration of soda-lime glass
WA Lanford, K Davis, P Lamarche, T Laursen, R Groleau, RH Doremus
Journal of non-crystalline solids 33 (2), 249-266, 1979
4001979
Quantitative analysis of hydrogen in glow discharge amorphous silicon
MH Brodsky, MA Frisch, JF Ziegler, WA Lanford
Applied Physics Letters 30 (11), 561-563, 1977
3651977
Advanced multilayer metallization schemes with copper as interconnection metal
SP Murarka, RJ Gutmann, AE Kaloyeros, WA Lanford
Thin Solid Films 236 (1-2), 257-266, 1993
3201993
The effect of sea level cosmic rays on electronic devices
JF Ziegler, WA Lanford
Journal of applied physics 52 (6), 4305-4312, 1981
2411981
Effects of the addition of small amounts of Al to copper: Corrosion, resistivity, adhesion, morphology, and diffusion
PJ Ding, WA Lanford, S Hymes, SP Murarka
Journal of applied physics 75 (7), 3627-3631, 1994
232*1994
Profiling hydrogen in materials using ion beams
JF Ziegler, CP Wu, P Williams, CW White, B Terreault, BMU Scherzer, ...
nuclear instruments and methods 149 (1-3), 19-39, 1978
2241978
Analysis for hydrogen by nuclear reaction and energy recoil detection
WA Lanford
Nuclear Instruments and Methods in Physics Research Section B: Beam …, 1992
2211992
Hydrogen content of a variety of plasma‐deposited silicon nitrides
R Chow, WA Lanford, W Ke‐Ming, RS Rosler
Journal of Applied Physics 53 (8), 5630-5633, 1982
2021982
15N hydrogen profiling: scientific applications
WA Lanford
Nuclear Instruments and Methods 149 (1-3), 1-8, 1978
2011978
Oxygen diffusion in olivine: Effect of oxygen fugacity and implications for creep
FJ Ryerson, WB Durham, DJ Cherniak, WA Lanford
Journal of Geophysical Research: Solid Earth 94 (B4), 4105-4118, 1989
1721989
Low-temperature passivation of copper by doping with Al or Mg
WA Lanford, PJ Ding, W Wang, S Hymes, SP Muraka
Thin Solid Films 262 (1-2), 234-241, 1995
1591995
Increased osteoblast adhesion on titanium‐coated hydroxylapatite that forms CaTiO3
TJ Webster, C Ergun, RH Doremus, WA Lanford
Journal of Biomedical Materials Research Part A: An Official Journal of The …, 2003
1492003
Reaction of water with glass: influence of a transformed surface layer
RH Doremus, Y Mehrotra, WA Lanford, C Burman
Journal of Materials Science 18 (2), 612-622, 1983
1451983
Oxidation resistant high conductivity copper films
PJ Ding, WA Lanford, S Hymes, SP Murarka
Applied Physics Letters 64 (21), 2897-2899, 1994
1281994
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