Massimo Bersani
Massimo Bersani
Fondazione Bruno Kessler - FBK, Trento, Italy
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Mechanical properties and strain monitoring of glass-epoxy composites with graphene-coated fibers
H Mahmood, L Vanzetti, M Bersani, A Pegoretti
Composites Part A: Applied Science and Manufacturing 107, 112-123, 2018
Transient enhanced diffusion of arsenic in silicon
S Solmi, M Ferri, M Bersani, D Giubertoni, V Soncini
Journal of applied physics 94 (8), 4950-4955, 2003
Pollen discrimination and classification by Fourier transform infrared (FT-IR) microspectroscopy and machine learning
R Dell’Anna, P Lazzeri, M Frisanco, F Monti, F Malvezzi Campeggi, ...
Analytical and bioanalytical chemistry 394, 1443-1452, 2009
P implantation into preamorphized germanium and subsequent annealing: Solid phase epitaxial regrowth, P diffusion, and activation
M Posselt, B Schmidt, W Anwand, R Grötzschel, V Heera, A Mücklich, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008
Investigation on indium diffusion in silicon
S Solmi, A Parisini, M Bersani, D Giubertoni, V Soncini, G Carnevale, ...
Journal of Applied Physics 92 (3), 1361-1366, 2002
Arsenic uphill diffusion during shallow junction formation
M Ferri, S Solmi, A Parisini, M Bersani, D Giubertoni, M Barozzi
Journal of Applied Physics 99 (11), 2006
Deactivation of ultrashallow boron implants in preamorphized silicon after nonmelt laser annealing with multiple scans
JA Sharp, NEB Cowern, RP Webb, KJ Kirkby, D Giubertoni, S Gennaro, ...
Applied physics letters 89 (19), 2006
Al–Sn thin films deposited by pulsed laser ablation
A Perrone, A Zocco, H De Rosa, R Zimmermann, M Bersani
Materials Science and Engineering: C 22 (2), 465-468, 2002
Real-time observation and optimization of tungsten atomic layer deposition process cycle
W Lei, L Henn-Lecordier, M Anderle, GW Rubloff, M Barozzi, M Bersani
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006
Boron-interstitial silicon clusters and their effects on transient enhanced diffusion of boron in silicon
S Solmi, M Bersani, M Sbetti, JL Hansen, AN Larsen
Journal of Applied Physics 88 (8), 4547-4552, 2000
Vacancy-engineering implants for high boron activation in silicon on insulator
AJ Smith, NEB Cowern, R Gwilliam, BJ Sealy, B Colombeau, EJH Collart, ...
Applied physics letters 88 (8), 2006
Effect of graphene nanoplatelets structure on the properties of acrylonitrile–butadiene–styrene composites
S Dul, L Fambri, C Merlini, GMO Barra, M Bersani, L Vanzetti, A Pegoretti
Polymer Composites 40 (S1), E285-E300, 2019
Copper–titanium thin film interaction
L Castoldi, G Visalli, S Morin, P Ferrari, S Alberici, G Ottaviani, F Corni, ...
Microelectronic engineering 76 (1-4), 153-159, 2004
Polyethylene wax/EPDM blends as shape-stabilized phase change materials for thermal energy storage
A Dorigato, MV Ciampolillo, A Cataldi, M Bersani, A Pegoretti
Rubber Chemistry and Technology 90 (3), 575-584, 2017
Hydrogen diffusion in
R Trotta, D Giubertoni, A Polimeni, M Bersani, M Capizzi, F Martelli, ...
Physical Review B 80 (19), 195206, 2009
Interphase exchange coupling in Fe∕ Sm–Co bilayers with gradient Fe thickness
M Yu, J Hattrick-Simpers, I Takeuchi, J Li, ZL Wang, JP Liu, SE Lofland, ...
Journal of applied physics 98 (6), 2005
Electrical activation of solid-phase epitaxially regrown ultra-low energy boron implants in Ge preamorphised silicon and SOI
JJ Hamilton, EJH Collart, B Colombeau, C Jeynes, M Bersani, ...
Nuclear Instruments and Methods in Physics Research Section B: Beam …, 2005
Nondestructive dose determination and depth profiling of arsenic ultrashallow junctions with total reflection X-ray fluorescence analysis compared to dynamic secondary ion mass …
G Pepponi, C Streli, P Wobrauschek, N Zoeger, K Luening, P Pianetta, ...
Spectrochimica Acta Part B: Atomic Spectroscopy 59 (8), 1243-1249, 2004
Dynamic secondary ion mass spectrometry and X-ray photoelectron spectroscopy on artistic bronze and copper artificial patinas
IZ Balta, S Pederzoli, E Iacob, M Bersani
Applied Surface Science 255 (12), 6378-6385, 2009
Diffusion and electrical activation of indium in silicon
S Scalese, M Italia, A La Magna, G Mannino, V Privitera, M Bersani, ...
Journal of applied physics 93 (12), 9773-9782, 2003
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